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Mop300-R High Vacuum Resistance Thermal Evaporation Coating Machine
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When you select Nichwell Solutions as your technology provider, you'll be placing your IT infrastructure in the hands of experienced, trained professionals. We take a different approach and the results are clear. People love our team and the services we provide. | |
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Mop300-R High Vacuum Resistance Thermal Evaporation Coating Machine
Technical Parameters:
1 background vacuum: 10-7 Torr;
2 single substrate design, size can be customized;
3 The substrate can be rotated and heated: 300 ℃ / 500 ℃ / 800 ℃;
4 Sputtering: 1-3 magnetron sputtering target guns, co-sputtering;
5 Electron beam evaporation: 4-6 crucible
6 thermal evaporation: 1-3 evaporation sources;
Type | Mop300 | Mop300-S |
Vacuum chamber | Φ300×H415mm； | Φ300×H450mm； |
Glass bell jar +304 stainless steel vacuum chamber base | 304 stainless steel vacuum chamber, mirror polished inner surface | |
Vacuum system | Compound molecular pump + joint venture mechanical pump (molecular pump pumping speed ≥400L / s) | |
| Control System | Manual button | Manual button |
Extra vacuum | Better than 3×10-5Pa（2×10-7Torr） | |
Vacuum recovery time | Up to 3×10-4Pa≤15min | |
Evaporation source | 2 ~ 3 groups of evaporation sources (compatible with metals and organics), can be co-evaporated | 2 ~ 3 groups of evaporation sources (compatible with metals and organics), can be co-evaporated |
Evaporation power | 2KW, one belt and two vacuum evaporation power supply, constant current output | 2KW, 1 belt with two constant current / constant power control, working current can be preset |
Substrate stage | 110mm square substrate or 15 ～ 25mm ITO / FTO glass 25 pieces, can be customized integrated high-precision etching mask plate; | |
Rate and film thickness monitoring | Monitoring thickness range: 1Å ～ 99µ9999Å, resolution 1Å; monitoring rate range: 0.1Å ～ 9999.9Å.S / s, resolution 0.1Å | |
Electronic control system | Manual button relay logic control; perfect program interlocking, complete anti-misoperation design and protection; system abnormalities such as water shortage, over-current and over-pressure alarm and corresponding protection measures are implemented | |
| Optional | Cooling circulating water machine / film thickness monitor / substrate table heating or water cooling / evaporation power supply, etc. | |
Equipment distribution | Voltage：AC220V/50HZ | |
Power：≤3.5KW | ||
Equipment size | Length × width: 1150mm×800mm； Length × width: 453"×315" | |
