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Mop300-S High Vacuum Magnetron Sputtering Coating Machine
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Mop300-S High Vacuum Magnetron Sputtering Coating Machine
Vacuum coating room | ||
|---|---|---|
| Description | Stainless steel bell cover +304 stainless steel vacuum chamber base size: Φ300×H450mm； | |
| Volume | 0.03m³ | |
Extra vacuum | ≤6. 67x10-5pa （2×10-7Torr） (after baking and degassing) | |
Vacuum recovery time | ≤6.67X10-4 pa(after baking and degassing) | |
| Leak rate | The leak detection shall be carried out according to GB T 32218-2015, and the final acceptance test shall be conducted according to the standard of ≤1x10-10PaL / s. | |
| Vacuum system | ||
| Description | Using "molecular pump + mechanical pump" high vacuum system: | |
| Molecular pump | Pumping speed: 1200L / S, a true quasi-oil-free vacuum system, using down-pumping to avoid the pumping weakness of the molecular pump and improve the pumping speed; the molecular pump is guaranteed for 5 years and provides direct replacement service for damage. * Optional imported molecular pump | |
| Vacuum pump | Specifications: Rotary vane vacuum pump, equipped with oil mist filter, with gas ballast control Flow rate: 36 m³ / h (21 cfm), double substrate, vacuum -3 mbar or dry pump (optional) * Optional dry vacuum pump | |
| Operating voltage | AC 230 V / 50-60 Hz, 10 A or AC 115 V / 50-60 Hz, 20 A (optional) | |
| Pumping speed | Pumping from the atmosphere to 9 × 10-4Pa≤30min (exposure to the atmosphere for a short time, flushing with dry nitrogen and starting pumping) | |
| Valve | Main valve: CC-200, high-vacuum electric linkage plug-in valve; Front stage valve / bypass valve: GDQ-40 high vacuum pneumatic baffle valve; | |
| Vacuum measurement | "Two lows and one high" (two resistance gauges measure low vacuum, one ionization gauge measures high vacuum) Digital display compound vacuum gauge, measuring range from 1 × 105Pa to 1 × 10-5Pa; displayed and controlled by PC, can be realized Operation interlocking linkage. * Optional imported wide range vacuum transmitter | |
| Vacuum measurement | Part adopts metal seal, part adopts fluorine rubber ring seal; | |
2 "permanent magnetron sputtering target (Target size diameter 50.8mm) | Structure | Centripetal sputtering, the distance between the magnetron target and the sample is adjustable from 90 to 140mm, each target has good water cooling and DC / RF / MF compatibility Electric control baffle assembly: 1 set Equipped with shielding cover to avoid cross contamination between targets (installation and use when non-co-sputtering); Can be folded to the center of the sample above, the distance between the target and the sample is adjustable; |
| Power supply | PID intelligent temperature control evaporation power supply, with evaporation source temperature measurement and power adjustment system, can perform real-time temperature measurement and temperature control, temperature control accuracy ± 1 ℃. | |
Number | 2 sets | |
| Control system | ||
| Description | Manual key operation | |
| Specifications | It can effectively solve the accuracy, stability and reliability of the coating. Perfect program interlocking, complete anti-misoperation design and protection; system abnormalities such as water shortage, over-current and over-pressure alarm and corresponding protection measures are implemented. | |
Control system | ||
Description | It can effectively solve the accuracy, stability and reliability of the coating. Perfect program interlocking, complete anti-misoperation design and protection; system abnormalities such as water shortage, over-current and over-pressure alarm and corresponding protection measures are implemented. | |
Water cooling system | ||
| 3 "permanent magnetron sputtering target (target size D76.2mm) | Centripetal sputtering, the distance between the magnetron target and the sample is adjustable from 90 to 110mm, has good water cooling and is DC / RF / MF compatible | |
| 2 "strong magnetron sputtering target (target size D56.8mm) | Centripetal sputtering, the distance between the magnetron target and the sample is adjustable from 90 to 110mm, has good water cooling and is DC / RF / MF compatible | |
| 3 "strong magnetron sputtering target (target size D76.2mm) | Centripetal sputtering, the distance between the magnetron target and the sample is adjustable from 90 to 110mm, has good water cooling and is DC / RF / MF compatible | |
| RF switch | Design 1 shift 2 shift gear function (that is, 1 set of power supply can be used for 2 sets of magnetron sputtering target at the same time), before and after shifting, there is generally no need to adjust other parameters of the power supply except power setting. | |
| Other instructions | ||
| Product certification | ISO9001 certification、CE certification、ULcertification | |
| Application considerations | For details, please refer to the instruction manual for danger, warning, caution, etc. | |
