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ATTO3-SS Stainless Steel High Vacuum Magnetron Sputtering Coating Machine
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ATTO3-SS Stainless Steel High Vacuum Magnetron Sputtering Coating Machine
Vacuum coating room | ||
|---|---|---|
| Description | Stainless steel bell cover +304 stainless steel vacuum chamber base size: Φ300×H450mm； | |
| Volume | 0.03m³ | |
Extra vacuum | ≤6. 67x10-5pa （2×10-7Torr） (after baking and degassing) | |
Vacuum recovery time | ≤6.67X10-4 pa(after baking and degassing) | |
| Leak rate | The leak detection shall be carried out according to GB T 32218-2015, and the final acceptance test shall be conducted according to the standard of ≤1x10-10PaL / s. | |
| Vacuum system | ||
| Description | Using "molecular pump + mechanical pump" high vacuum system: | |
| Molecular pump | Pumping speed: 1200L / S, a true quasi-oil-free vacuum system, using down-pumping to avoid the pumping weakness of the molecular pump and improve the pumping speed; the molecular pump is guaranteed for 5 years and provides direct replacement service for damage. * Optional imported molecular pump | |
| Vacuum pump | Specifications: Rotary vane vacuum pump, equipped with oil mist filter, with gas ballast control Flow rate: 36 m³ / h (21 cfm), double substrate, vacuum -3 mbar or dry pump (optional) * Optional dry vacuum pump | |
| Operating voltage | AC 230 V / 50-60 Hz, 10 A or AC 115 V / 50-60 Hz, 20 A (optional) | |
| Pumping speed | Pumping from the atmosphere to 9 × 10-4Pa≤30min (exposure to the atmosphere for a short time, flushing with dry nitrogen and starting pumping) | |
| Valve | Main valve: CC-200, high-vacuum electric linkage plug-in valve; Front stage valve / bypass valve: GDQ-40 high vacuum pneumatic baffle valve; | |
| Vacuum measurement | "Two lows and one high" (two resistance gauges measure low vacuum, one ionization gauge measures high vacuum) Digital display compound vacuum gauge, measuring range from 1 × 105Pa to 1 × 10-5Pa; displayed and controlled by PC, can be realized Operation interlocking linkage. * Optional imported wide range vacuum transmitter | |
| Vacuum measurement | Part adopts metal seal, part adopts fluorine rubber ring seal; | |
2 "permanent magnetron sputtering target (Target size diameter 50.8mm) | Structure | Centripetal sputtering, the distance between the magnetron target and the sample is adjustable from 90 to 140mm, each target has good water cooling and DC / RF / MF compatibility Electric control baffle assembly: 1 set Equipped with shielding cover to avoid cross contamination between targets (installation and use when non-co-sputtering); Can be folded to the center of the sample above, the distance between the target and the sample is adjustable; |
| Power supply | PID intelligent temperature control evaporation power supply, with evaporation source temperature measurement and power adjustment system, can perform real-time temperature measurement and temperature control, temperature control accuracy ± 1 ℃. | |
Number | 2 sets | |
| Control system | ||
| Description | Adopt windows operating platform and cotrl2000 control system, and adopt IPC + network technology to realize parameter setting of main components of the whole machine, implement real-time monitoring and intelligent diagnosis of faults, and automatic monitoring of film thickness. There are two modes of automatic and manual control. In addition to taking and placing samples, all other operating processes are controlled by software on the PC; provide a friendly man-machine interface such as vacuum system, process setting, gas filling and degassing system; parameters can be set on the industrial computer through the recipe to realize the process and process Setting, storage and printing of equipment parameters. | |
| Specifications | It can effectively solve the accuracy, stability and reliability of the coating. Perfect program interlocking, complete anti-misoperation design and protection; system abnormalities such as water shortage, over-current and over-pressure alarm and corresponding protection measures are implemented. It adopts rich I / O interface design to fully meet the functional requirements of expansion and external devices. The display controls the door opening / closing of the coating machine. Coating process, procedure, film thickness, convenient and save printing. | |
Film thickness monitoring and control system | ||
| Description | A quartz crystal film thickness controller is used, a water-cooled film thickness probe is installed near the substrate table, and the industrial computer is connected. The film thickness meter is used to monitor the coating rate and final thickness in real time, and the accuracy can reach ± 1A (0.1nm). Real-time information is fed back to the industrial control machine. If the coating thickness reaches the set thickness, it can automatically control the power supply and stop the coating to achieve the purpose of automatic control of the film thickness. | |
| Range | Monitoring thickness range: 1 Å ~ 99 μ 9999 Å, resolution: 1 Å | |
Feature | The coating process, process, and film thickness are all set on the PC, which can realize automatic control of the whole process. The coating process can be set on the PC and the data can be recorded. | |
Water cooling system | ||
Description | The cooling water path is 8 in and 8 out, and the total water intake is controlled by a water pressure relay. The total inlet water and outlet water are connected with 1P refrigeration circulating water machine, and the temperature control range is 10-25 ℃. Provide stable cooling and circulating water to the target, metal source, molecular pump and magnetic fluid to ensure the stable operation of the equipment. | |
Optional equipment | ||
| 3 "permanent magnetron sputtering target (target size D76.2mm) | Centripetal sputtering, the distance between the magnetron target and the sample is adjustable from 90 to 110mm, has good water cooling and is DC / RF / MF compatible | |
| 2 "strong magnetron sputtering target (target size D56.8mm) | Centripetal sputtering, the distance between the magnetron target and the sample is adjustable from 90 to 110mm, has good water cooling and is DC / RF / MF compatible | |
| 3 "strong magnetron sputtering target (target size D76.2mm) | Centripetal sputtering, the distance between the magnetron target and the sample is adjustable from 90 to 110mm, has good water cooling and is DC / RF / MF compatible | |
| RF switch | Design 1 shift 2 shift gear function (that is, 1 set of power supply can be used for 2 sets of magnetron sputtering target at the same time), before and after shifting, there is generally no need to adjust other parameters of the power supply except power setting. | |
| Other instructions | ||
| Product certification | ISO9001 certification、CE certification、ULcertification | |
| Application considerations | For details, please refer to the instruction manual for danger, warning, caution, etc. | |
