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μ-401A-RO Lab Thermal & Organic Evaporation Deposition Platform
μ-401A-RO Lab Thermal & Organic Evaporation Deposition Platform
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磁控溅射是物理气相沉积技术(Physical Vapor Deposition, PVD)的一种。一般用于制备金属、半导体、绝缘体等薄膜材料，具有设备简单、易于控制、效率高，面积大等优点。 ..
μ-401A-ROG Lab Thermal & Organic Evaporation Deposition Platform &Glovebox System
μ-401A-ROG Lab Thermal & Organic Evaporation Deposition Platform &Glovebox System
Request Quote
磁控溅射是物理气相沉积技术(Physical Vapor Deposition, PVD)的一种。一般用于制备金属、半导体、绝缘体等薄膜材料，具有设备简单、易于控制、效率高，面积大等优点。 ..
μ-401A-RO Lab Thermal & Organic Evaporation Deposition Platform
μ-401A-RO Lab Thermal & Organic Evaporation Deposition Platform
Request Quote
μ-401A-ROG Lab Thermal & Organic Evaporation Deposition Platform &Glovebox System
μ-401A-ROG Lab Thermal & Organic Evaporation Deposition Platform &Glovebox System
Request Quote
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